Tungsten hexafluoride,WF6

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CAS NO	7783-82-6
UN NO	UN2196
EINECS NO	232-029-1
Molecular weight	297.83
Appearance	Colorless gas
Melting point	2.3 ℃
Boiling point	17.1 ℃
Density	13.0 kg/m
DOT Class	2.3
Label	Toxic gas

Tungsten hexafluoride (WF₆) is an essential electronic gas used in the chemical vapor deposition process in semiconductor manufacturing. It can be reduced by hydrogen, thereby depositing high-purity tungsten films in chip holes and contact holes, making it a crucial interconnection metal material.

Product Application

Semiconductor Chemical Vapor Deposition (CVD): As a core raw material, tungsten films are deposited on the surface of wafers for filling contact holes and manufacturing interconnects within the chips. It is particularly suitable for 3D NAND flash memory (with breakthroughs in the number of layers reaching 232 and 300 layers) and advanced storage chips such as DRAM, as well as advanced logic chips with a 7nm or lower manufacturing process.

Preparation of high-purity tungsten and coatings: Prepare high-purity tungsten powder as an gaseous raw material; or form a hard tungsten carbide coating on the surface of steel using CVD technology, which is used for aerospace engine components, high-temperature molds, and protective layers of nuclear fusion devices to enhance wear resistance and high-temperature resistance.

Atomic Layer Deposition (ALD): In advanced manufacturing processes with a feature size of 5nm and below, it is used to deposit tungsten films that are denser, more uniform, and have controllable thickness.

Gas purity

Specification	99.9999%
O2+Ar	＜0.001 ppbw
N2	＜0.001 ppbw
CO	＜0.003 ppbw
CO2	＜0.008 ppbw
Li	＜0.001 ppbw
Na	＜0.001 ppbw
Mg	0.01 ppbw
Al	＜0.002 ppbw
K	＜0.001 ppbw
Ca	＜0.001 ppbw

Specification	99.9999%
Cr	＜0.001 ppbw
Mn	＜0.001 ppbw
Fe	＜0.003 ppbw
CO	＜0.003 ppbw
Ni	＜0.004 ppbw
Cu	＜0.001 ppbw
Zn	＜0.001 ppbw
Cd	＜0.001 ppbw
Pb	＜0.001 ppbw
Th	＜0.001 ppbw

Specification	99.9999%
U	＜0.001 ppbw
P	＜0.010 ppbw
Ti	＜0.001 ppbw
As	＜0.001 ppbw
Mo	＜0.001 ppbw
Si	＜0.001 ppbw
B	＜0.003 ppbw
SiF4	＜0.003 ppbw
SF6	＜0.027 ppbw
HF	0.185 ppbw
CF4	＜0.010 ppbw
Other metals	＜0.001 ppbw