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Carbon Tetrafluoride, CF4 Specialty Gas

CAS NO  75-73-0
UN NO  1982
EINECS NO  200-896-5
Molecular weight  88
Appearance  Colorless, Odorless
Melting point  -184 ℃
Boiling point  -128.1 ℃
Density  3.72 kg/m³
DOT Class  2.2
Label  Non-flammable Gas
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Tetrafluoromethane is a colorless, non-flammable gas. As a compressed gas at room temperature, CF4 is one of the most stable organic compounds. At 900℃, CF4 does not react with Cu, Ni, W, Mo, and only slowly decompose at carbon arc temperature. When burned with combustible gases, they decompose to produce toxic fluoride. In case of high heat, the pressure inside the container increases, there is a risk of cracking and explosion.


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It is the most used plasma etching gas in microelectronics industry.

Carbon tetrafluoride high purity gas and the mixture of tetrafluoromethane high purity gas and high purity oxygen can be widely used in the etching of silicon, silicon dioxide, silicon nitride, phosphorus silicon glass and tungsten thin film materials.

It is also widely used in surface cleaning of electronic devices, solar cell production, laser technology, low temperature refrigeration, leak inspection, and stain remover in printed circuit production.

Industrial Grade

Oxygen + Argon≤ 1 ppm
Nitrogen≤ 2 ppm
Hydrogen≤ 0.3 ppm
Carbon Monoxide≤ 0.3 ppm
Carbon Dioxide≤ 0.3 ppm
Sulfur Hexafluoride≤ 0.3 ppm
THC≤ 0.3 ppm
Trifluoromethane≤ 0.3 ppm
OFC≤ 1 ppm
Moisture≤ 1 ppm
Acidity as HF≤ 0.1 ppm
Other Grades and Purity Available on Asking

Package Information

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